Invention Grant
- Patent Title: Apparatus for materials processing
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Application No.: US16445194Application Date: 2019-06-18
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Publication No.: US11691216B2Publication Date: 2023-07-04
- Inventor: Joseph Ting , Charles Holland Dresser , Jayant Bhawalkar
- Applicant: Avava, Inc.
- Applicant Address: US MA Waltham
- Assignee: Avava, Inc.
- Current Assignee: Avava, Inc.
- Current Assignee Address: US MA Waltham
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Main IPC: B23K26/064
- IPC: B23K26/064 ; B23K26/03 ; B23K26/062 ; B23K103/00

Abstract:
A method includes depositing a plurality of dopant particles within a predetermined region of a transparent material. The method also includes focusing a laser beam along an optical axis to a focal region that overlaps with at least a portion of the predetermined region. The focal region can irradiate at least a first dopant particle of the plurality of dopant particles. The method further includes adjusting a parameter of the laser beam to generate a plasma configured to form an inclusion within the transparent material. The method additionally includes scanning the focal region along a path within the transparent material to elongate the inclusion generally along the path.
Public/Granted literature
- US20190389000A1 APPARATUS FOR MATERIALS PROCESSING Public/Granted day:2019-12-26
Information query
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