Invention Grant
- Patent Title: Method for producing InP quantum dot precursor and method for producing InP-based quantum dot
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Application No.: US17601753Application Date: 2020-03-26
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Publication No.: US11692134B2Publication Date: 2023-07-04
- Inventor: Kazuhiro Nakatsui , Taiki Tsuzukiishi , Tomo Sakanoue
- Applicant: NIPPON CHEMICAL INDUSTRIAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: NIPPON CHEMICAL INDUSTRIAL CO., LTD.
- Current Assignee: NIPPON CHEMICAL INDUSTRIAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JP 19078007 2019.04.16 JP 19221374 2019.12.06
- International Application: PCT/JP2020/013797 2020.03.26
- International Announcement: WO2020/213365A 2020.10.22
- Date entered country: 2021-10-06
- Main IPC: C09K11/70
- IPC: C09K11/70 ; C01B25/08 ; C07F9/06 ; C09K11/08 ; B82Y20/00 ; B82Y40/00

Abstract:
The present invention relates to a method for producing an InP-based quantum dot precursor from a phosphorus source and an indium source, in which a silylphosphine compound represented by the following Formula (1) with a content of a compound represented by the following Formula (2) of 0.3 mol % or less is used as the phosphorus source. Further, the present invention provides a method for producing an InP-based quantum dot comprising heating an InP quantum dot precursor to a temperature of 200° C. or more and 350° C. or less to obtain an InP quantum dot.
(R is as defined in the specification.)
(R is as defined in the specification.)
Public/Granted literature
- US20220195299A1 METHOD FOR PRODUCING InP QUANTUM DOT PRECURSOR AND METHOD FOR PRODUCING InP-BASED QUANTUM DOT Public/Granted day:2022-06-23
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