Invention Grant
- Patent Title: Die bonding apparatus and manufacturing method for semiconductor device
-
Application No.: US17378049Application Date: 2021-07-16
-
Publication No.: US11692947B2Publication Date: 2023-07-04
- Inventor: Yuta Ono , Hideharu Kobashi , Koji Hosaka , Masaaki Yoshiyama
- Applicant: Fasford Technology Co., Ltd.
- Applicant Address: JP Minami-Alps
- Assignee: Fasford Technology Co., Ltd.
- Current Assignee: Fasford Technology Co., Ltd.
- Current Assignee Address: JP Minami-Alps
- Agency: Crowell & Moring LLP
- Priority: JP 20130329 2020.07.31
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01N21/88 ; G06T7/00

Abstract:
A die bonding apparatus includes a first illumination device for irradiating a die with light along an optical axis of a photographing device, and a second illumination device that is located above the first illumination device and irradiates the die with light having a predefined angle with respect to the optical axis. The second illumination device includes a second light emitting section, and a light path control member that limits a light path of second irradiation light emitted from the second light emitting section. The second illumination device is disposed in such a way that the second irradiation light, the light path of which is limited by the light path control member, passes through the cylinder of the first illumination device, and the top surface of the die is irradiated with the second irradiation light.
Public/Granted literature
- US20220034823A1 Die Bonding Apparatus and Manufacturing Method for Semiconductor Device Public/Granted day:2022-02-03
Information query