Invention Grant
- Patent Title: Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generator
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Application No.: US17238355Application Date: 2021-04-23
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Publication No.: US11693315B2Publication Date: 2023-07-04
- Inventor: Eunkyung Lee , Sumin Kim , Hyunwoo Kim , Juhyeon Park , Giyoung Song , Sukkoo Hong , Yoonhyun Kwak , Youngmin Nam , Byunghee Sohn , Sunyoung Lee , Aram Jeon , Sungwon Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Cantor Colburn LLP
- Priority: KR 20200163340 2020.11.27
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; G03F7/039 ; C07C309/12 ; C07D333/76 ; C07C381/12
Abstract:
Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:
wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
Public/Granted literature
Information query
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