Invention Grant
- Patent Title: Radiation source apparatus and method for using the same
-
Application No.: US17407291Application Date: 2021-08-20
-
Publication No.: US11694820B2Publication Date: 2023-07-04
- Inventor: Wei-Chung Tu , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: G21K1/06
- IPC: G21K1/06 ; G02B5/08 ; G02B5/10 ; G03F7/20 ; H05G2/00 ; G03F7/00

Abstract:
A radiation source apparatus includes a vessel, a laser source, a collector, and a reflective mirror. The vessel has an exit aperture. The laser source is at one end of the vessel and configured to excite a target material to form a plasma. The collector is disposed in the vessel and configured to collect a radiation emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel. The reflective mirror is in the vessel and configured to reflect the laser beam toward an edge of the vessel.
Public/Granted literature
- US20220359097A1 RADIATION SOURCE APPARATUS AND METHOD FOR USING THE SAME Public/Granted day:2022-11-10
Information query