Invention Grant
- Patent Title: Gas supply system, plasma processing apparatus, and control method for gas supply system
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Application No.: US17560242Application Date: 2021-12-22
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Publication No.: US11694878B2Publication Date: 2023-07-04
- Inventor: Atsushi Sawachi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Weihrouch IP
- Priority: JP 18126127 2018.07.02
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/455 ; H01L21/67

Abstract:
When a gas supplied to a gas injection unit is switched from a first processing gas to a second processing gas, a controller of a gas supply system performs control to open a first supply on/off valve connected to the gas injection unit and provided in a first gas supply line for supplying the first processing gas and a second exhaust on/off valve provided in a first gas exhaust line branched from the first gas supply line, close a second supply on/off valve connected to the gas injection unit and provided in a second gas supply line for supplying the second processing gas and a first exhaust on/off valve provided in a second gas exhaust line branched from the second gas supply line; and then open the second supply on/off valve and the first exhaust on/off valve and close the first supply on/off valve and the second exhaust on/off valve.
Public/Granted literature
- US20220115213A1 GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD FOR GAS SUPPLY SYSTEM Public/Granted day:2022-04-14
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