Invention Grant
- Patent Title: Capacitor with an electrode well
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Application No.: US17452695Application Date: 2021-10-28
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Publication No.: US11695013B2Publication Date: 2023-07-04
- Inventor: Ronghua Zhu , Xin Lin , Todd Roggenbauer
- Applicant: NXP USA, INC.
- Applicant Address: US TX Austin
- Assignee: NXP USA, INC.
- Current Assignee: NXP USA, INC.
- Current Assignee Address: US TX Austin
- Agent David G. Dolezal
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/94 ; H01L27/105

Abstract:
A capacitor includes an electrode implemented in an electrode well of a substrate. The electrode well has a net N-type dopant concentration. The capacitor includes an electrode implemented in a conductive structure located above the substrate. The electrodes are separated by a dielectric layer located between the electrodes. A first tub region having a net P-type conductivity dopant concentration is located below and laterally surrounds the electrode well and a second tub region having a net N-type conductivity dopant concentration is located below and laterally surrounds the first tub region and the electrode well.
Public/Granted literature
- US20230138580A1 CAPACITOR WITH AN ELECTRODE WELL Public/Granted day:2023-05-04
Information query
IPC分类: