Invention Grant
- Patent Title: Integrated circuit device
-
Application No.: US17740316Application Date: 2022-05-09
-
Publication No.: US11696437B2Publication Date: 2023-07-04
- Inventor: Meng-Sheng Chang , Chien-Ying Chen , Chia-En Huang , Yih Wang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: H10B20/20
- IPC: H10B20/20 ; G06F30/392 ; H01L23/522 ; H01L23/528

Abstract:
An IC device includes first through third device pairs positioned in first through third active areas extending in a first direction, each pair including first and second transistors coupled between respective first and second anti-fuse structures and a shared bit line contact, and each of the first and third active areas being adjacent to the second active area. First through fourth conductive lines extend in a second direction, first and second conductive paths couple the first conductive line to the first anti-fuse structures, a third conductive path couples the fourth conductive line to the second anti-fuse structures, and a fourth conductive path couples the third conductive line to the second transistors. The first and third conductive paths are aligned along the first direction between the first and second active areas, and the second and fourth conductive paths are aligned along the first direction between the second and third active areas.
Public/Granted literature
- US20220271049A1 INTEGRATED CIRCUIT DEVICE Public/Granted day:2022-08-25
Information query