The present invention provides an imprint method of forming a pattern of an imprint material on a substrate using a mold, the method including obtaining a state of a light blocking member provided outside a pattern region of the mold, the light blocking member being configured to block light, determining, based on the state of the light blocking member obtained in the obtaining, whether the mold is usable, and curing the imprint material by irradiating the imprint material with the light in a state in which the mold determined to be usable in the determining is in contact with the imprint material on the substrate.