Invention Grant
- Patent Title: Image sensor and method of manufacturing same
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Application No.: US16872041Application Date: 2020-05-11
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Publication No.: US11700463B2Publication Date: 2023-07-11
- Inventor: Woo-Sung Choi , Man-Lyun Ha , Ju-Il Lee
- Applicant: DB HiTek Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: DB HiTek, Co., Ltd.
- Current Assignee: DB HiTek, Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Central California IP Group, P.C.
- Agent Andrew D. Fortney
- Priority: KR 20190055434 2019.05.13
- Main IPC: H04N5/355
- IPC: H04N5/355 ; H01L27/146

Abstract:
An image sensor having a shield including, for example, a metal, is above an electrical charge storage element in a pixel region to block light incident toward the electrical charge storage element, thereby making it possible to reduce or prevent reading a charge value including leakage charge introduced to the electrical charge storage element, and thus adversely affecting an image result.
Public/Granted literature
- US11641527B2 Image sensor and method of manufacturing same Public/Granted day:2023-05-02
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