Invention Grant
- Patent Title: N-alkyl substituted cyclic and oligomeric perhydridosilazanes, methods of preparation thereof, and silicon nitride films formed therefrom
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Application No.: US17210652Application Date: 2021-03-24
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Publication No.: US11702434B2Publication Date: 2023-07-18
- Inventor: Barry C. Arkles , Youlin Pan , Fernando Jove
- Applicant: Gelest Technologies, Inc.
- Applicant Address: US PA Morrisville
- Assignee: GELEST, INC.
- Current Assignee: GELEST, INC.
- Current Assignee Address: US PA Morrisville
- Agency: Panitch Schwarze Belisario & Nadel LLP
- The original application number of the division: US15070693 2016.03.15
- Main IPC: C07F7/21
- IPC: C07F7/21 ; H01L21/02 ; C01B21/068 ; C07F7/02 ; C08G77/62
Abstract:
Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
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