Invention Grant
- Patent Title: Strain gauge
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Application No.: US17929830Application Date: 2022-09-06
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Publication No.: US11702730B2Publication Date: 2023-07-18
- Inventor: Toshiaki Asakawa , Yuta Aizawa , Shinya Toda , Shintaro Takata , Shinichi Niwa
- Applicant: MINEBEA MITSUMI Inc.
- Applicant Address: JP Nagano
- Assignee: MINEBEA MITSUMI Inc.
- Current Assignee: MINEBEA MITSUMI Inc.
- Current Assignee Address: JP Nagano
- Agency: IPUSA, PLLC
- Priority: JP 17191820 2017.09.29
- Main IPC: C23C14/20
- IPC: C23C14/20 ; C23C14/00 ; C23C14/06 ; C23C14/08 ; C23C14/10 ; G01B7/16 ; G01L1/22

Abstract:
A strain gauge includes a flexible substrate and a functional layer formed of a metal, an alloy, or a metal compound, the functional layer being directly on one surface of the substrate. The strain gauge includes a resistor formed of a film that includes Cr, CrN, and Cr2N and that is formed with α-Cr as a main component. The functional layer includes a function of promoting crystal growth of α-Cr and forming an α-Cr based film.
Public/Granted literature
- US20220411915A1 STRAIN GAUGE Public/Granted day:2022-12-29
Information query
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