Invention Grant
- Patent Title: Rotation driving mechanism and rotation driving method, and substrate processing apparatus and substrate processing method using same
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Application No.: US16953930Application Date: 2020-11-20
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Publication No.: US11702747B2Publication Date: 2023-07-18
- Inventor: Manabu Honma
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Ipusa, PLLC
- Priority: JP 19215580 2019.11.28
- Main IPC: C23C16/458
- IPC: C23C16/458 ; C23C16/455 ; H01L21/687 ; H01L21/02

Abstract:
A rotation driving mechanism includes a turntable configured to rotate about a first axis, and a rotating plate disposed along a circumferential direction of the turntable and configured to rotate about a second axis independently of a rotation of the turntable. A driving plate is coaxially disposed with the first axis and is rotatable differently in rotational direction and rotational speed from the rotation of the turntable. A trajectory plate is fixed to the driving plate and disposed in the vicinity of the second axis of the rotating plate. The trajectory plate includes a rolling trajectory groove in a surface. The trajectory groove has a curved shape in a plan view. A horizontal rotating member is coupled to and fixed to the rotating plate and engaged with the rolling trajectory groove. The horizontal rotating member rotates the rotating plate by moving and rolling through the rolling trajectory groove.
Public/Granted literature
Information query
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