Invention Grant
- Patent Title: Material processing path selection method and device
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Application No.: US17687388Application Date: 2022-03-04
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Publication No.: US11703839B2Publication Date: 2023-07-18
- Inventor: Lin Cui
- Applicant: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Current Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Anova Law Group, PLLC
- Priority: CN 1910843955.6 2019.09.06
- Main IPC: G05B19/418
- IPC: G05B19/418 ; B08B13/00 ; H01L21/677

Abstract:
A material processing path selection method includes calculating a plurality of candidate material processing paths, determining a bottleneck process tank, and for each of the plurality of candidate material processing paths, calculating a bottleneck process tank utilization rate to select a candidate material processing path with a highest bottleneck process tank utilization rate in the plurality of candidate material processing paths as a target material processing path. The bottleneck process tank is a process tank having a highest use frequency among all process tanks, A use frequency of the process tank is equal to a total process time length of all materials that need to be transferred to the process tank divided by a number of all the materials that need to be transferred to the process tank.
Public/Granted literature
- US20220187807A1 MATERIAL PROCESSING PATH SELECTION METHOD AND DEVICE Public/Granted day:2022-06-16
Information query
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