Invention Grant
- Patent Title: Plasma probe device, plasma processing apparatus, and control method
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Application No.: US17006201Application Date: 2020-08-28
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Publication No.: US11705310B2Publication Date: 2023-07-18
- Inventor: Taro Ikeda , Mikio Sato , Eiki Kamata
- Applicant: TOYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer; Tanya E. Harkins
- Priority: JP 19162336 2019.09.05
- Main IPC: H01J37/32
- IPC: H01J37/32 ; G01R1/07
Abstract:
A plasma probe device includes: an antenna installed in an opening portion formed in a wall of a processing container via a seal member that seals between a vacuum space and an atmospheric space; and a light transmission portion installed inside the antenna or forming at least a portion of the antenna, and configured to transmit emission of plasma generated in the vacuum space to the atmospheric space.
Public/Granted literature
- US20210074516A1 PLASMA PROBE DEVICE, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD Public/Granted day:2021-03-11
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