Invention Grant
- Patent Title: Mounting table and plasma processing apparatus
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Application No.: US16925902Application Date: 2020-07-10
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Publication No.: US11705356B2Publication Date: 2023-07-18
- Inventor: Kyouhei Yamamoto , Taira Takase
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP 13016703 2013.01.31
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/683 ; H01L21/67

Abstract:
A mounting table includes a base member, having a rear surface and a front surface facing the rear surface, in which a coolant path is formed, a groove portion having a bottom surface within the base member being annularly formed on the front surface, the base member being divided into a cylindrical inner base member portion positioned at an inner side of the groove portion and an annular outer base member portion positioned at an outer side of the groove portion by the groove portion; an annular focus ring supported by the outer base member portion, the annular focus ring having, at an inner side surface thereof, a protrusion that is protruded radially and inwardly to cover the groove portion; a first heat transfer member provided between the mounting surface and the coolant path; and the second heat transfer member provided between the focus ring and the coolant path.
Public/Granted literature
- US20200343122A1 MOUNTING TABLE AND PLASMA PROCESSING APPARATUS Public/Granted day:2020-10-29
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