Invention Grant
- Patent Title: Method and system for generating layout design of integrated circuit
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Application No.: US17386413Application Date: 2021-07-27
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Publication No.: US11709987B2Publication Date: 2023-07-25
- Inventor: Shih-Yao Lin , Yi-Lin Chuang , Yin-An Chen , Shih Feng Hong
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT Law
- Agent Anthony King
- Main IPC: G06F30/398
- IPC: G06F30/398 ; G06F30/27 ; G06N20/00 ; G06F30/392 ; G06F30/3953 ; G06N20/10 ; G06N3/08 ; G06F30/396

Abstract:
A method of generating an integrated circuit includes providing a placing layout of the integrated circuit; generating a routed layout of the integrated circuit, the routed layout includes a layout region with a systematic design rule check (DRC) violation; generating an adjusted routing layout of the integrated circuit by adjusting the layout region with the systematic DRC violation according to a target placement recipe in a plurality of placement recipes; extracting features of the placing layout to obtain an extracted data; extracting features of the layout region with the systematic DRC violation to obtain an extracted routing data; performing a training process upon the extracted data and the extracted routing data to generate a plurality of aggregated-cluster models; and selecting a target aggregated-cluster model from the plurality of aggregated-cluster models by comparing the extracted data to the plurality of aggregated-cluster models.
Public/Granted literature
- US20210357569A1 METHOD AND SYSTEM FOR GENERATING LAYOUT DESIGN OF INTEGRATED CIRCUIT Public/Granted day:2021-11-18
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