Invention Grant
- Patent Title: Wafer processing method
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Application No.: US17081043Application Date: 2020-10-27
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Publication No.: US11712747B2Publication Date: 2023-08-01
- Inventor: Ye Chen
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP 19201191 2019.11.06
- Main IPC: B23K1/00
- IPC: B23K1/00 ; B23K20/02 ; H01L21/78 ; H01L21/304 ; B23K26/40 ; H01L21/447

Abstract:
A wafer processing method for processing a wafer formed on a front surface thereof with a plurality of devices having projection-shaped electrodes, the devices being partitioned by streets, includes a cutting step of holding a back surface of the wafer by a holding surface of a chuck table and cutting head portions of the projection-shaped electrodes by a cutting tool slewed in parallel to the holding surface, to make uniform the electrodes in height and expose metallic surfaces; a thermocompression bonding sheet laying step of laying a thermocompression bonding sheet on the front surface of the wafer; a thermocompression bonding step of heating and pressing the thermocompression bonding sheet to perform thermocompression bonding; and a peeling step of peeling off the thermocompression bonding sheet from the wafer, before dividing the wafer into individual device chips and bonding the electrodes to a circuit board.
Public/Granted literature
- US20210129260A1 WAFER PROCESSING METHOD Public/Granted day:2021-05-06
Information query
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