Invention Grant
- Patent Title: Laser processing method
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Application No.: US15956094Application Date: 2018-04-18
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Publication No.: US11712757B2Publication Date: 2023-08-01
- Inventor: Kaori Tateishi , Yasushi Ito
- Applicant: Via Mechanics, Ltd.
- Applicant Address: JP Kanagawa
- Assignee: VIA MECHANICS, LTD.
- Current Assignee: VIA MECHANICS, LTD.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Priority: JP 17092137 2017.05.08
- Main IPC: B23K26/386
- IPC: B23K26/386 ; B23K26/40 ; C03C15/00 ; C03C23/00 ; B23K26/18 ; B23K26/384 ; B23K26/0622 ; B23K26/402 ; B23K26/382 ; B23K103/00

Abstract:
Provided is a laser processing method for drilling a hole in a glass substrate with using a carbon dioxide laser, including the steps of: irradiating the laser onto a drilling position on the glass substrate from a side of the glass substrate on which a protective sheet is adhered so as to form a blind hole; removing the protective sheet from the glass substrate and performing an annealing treatment; and performing a wet-etching process on a side of the glass substrate not irradiated with the laser so as to convert the blind hole into a through hole.
Public/Granted literature
- US20180318965A1 LASER PROCESSING METHOD Public/Granted day:2018-11-08
Information query
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