Invention Grant
- Patent Title: Barrier material formation composition, barrier material, production method for barrier material, product, and production method for product
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Application No.: US16759566Application Date: 2018-10-31
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Publication No.: US11713375B2Publication Date: 2023-08-01
- Inventor: Tomohiko Kotake , Tatsuya Makino , Yuta Akasu
- Applicant: HITACHI CHEMICAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: RESONAC CORPORATION
- Current Assignee: RESONAC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Priority: WO TJP2017039295 2017.10.31
- International Application: PCT/JP2018/040571 2018.10.31
- International Announcement: WO2019/088191A 2019.05.09
- Date entered country: 2020-04-27
- Main IPC: C08G77/398
- IPC: C08G77/398 ; C08J5/18 ; C09D183/04 ; C08G77/18 ; C08G77/38 ; C08G79/10 ; C08G77/58
Abstract:
The present invention provides a barrier material formation composition comprising a silane oligomer, at least a part of the silane oligomer being modified with a metal alkoxide.
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