Invention Grant
- Patent Title: Chemical resistant multi-layer coatings applied by atomic layer deposition
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Application No.: US17840367Application Date: 2022-06-14
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Publication No.: US11713504B2Publication Date: 2023-08-01
- Inventor: I-Kuan Lin , Carlo Waldfried , Chandrasekaran Venkatraman
- Applicant: ENTEGRIS, INC.
- Applicant Address: US MA Billerica
- Assignee: ENTEGRIS, INC.
- Current Assignee: ENTEGRIS, INC.
- Current Assignee Address: US MA Billerica
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/455 ; C23C16/44
Abstract:
Described are multi-layer coatings, substrates (i.e., articles) coated with a multi-layer coating, and methods of preparing a multi-layer coating by atomic layer deposition, wherein the coating includes layers alumina and yttria.
Public/Granted literature
- US20220316056A1 CHEMICAL RESISTANT MULTI-LAYER COATINGS APPLIED BY ATOMIC LAYER DEPOSITION Public/Granted day:2022-10-06
Information query
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