Invention Grant
- Patent Title: Flow guide apparatus and vapor deposition device
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Application No.: US17237118Application Date: 2021-04-22
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Publication No.: US11713509B2Publication Date: 2023-08-01
- Inventor: Qiang Zhang , Beumku Park , Yuanjiang Yang , Tianming Li , Qingke He , Jie Li , Ya Zhu , Yu Wang , Fujun Yuan , Binglei Cao , Xinxin Huang
- Applicant: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Sichuan
- Assignee: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Sichuan; CN Beijing
- Agency: Dority & Manning, P.A.
- Priority: CN 2020631414.5 2020.04.23
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/455 ; H01L27/12

Abstract:
A flow guide apparatus includes a columnar flow guide portion, a plurality of connection portions and a loop portion. The columnar flow guide portion includes a first surface and a second surface that are perpendicular to a thickness direction thereof, and a blind hole formed in the second surface. A center line of the columnar flow guide portion is parallel to the thickness direction thereof. The plurality of connection portions are arranged at intervals and are at least connected with an edge of the second surface of the columnar flow guide portion. The loop portion is connected with the plurality of connection portions, and is farther away from the columnar flow guide portion than the plurality of connection portions.
Public/Granted literature
- US20210332480A1 FLOW GUIDE APPARATUS AND VAPOR DEPOSITION DEVICE Public/Granted day:2021-10-28
Information query
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