Invention Grant
- Patent Title: Group-III nitride substrate
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Application No.: US17023720Application Date: 2020-09-17
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Publication No.: US11713517B2Publication Date: 2023-08-01
- Inventor: Yusuke Mori , Masashi Yoshimura , Masayuki Imanishi , Akira Kitamoto , Junichi Takino , Tomoaki Sumi , Yoshio Okayama
- Applicant: Panasonic Corporation
- Applicant Address: JP Osaka
- Assignee: PANASONIC HOLDINGS CORPORATION
- Current Assignee: PANASONIC HOLDINGS CORPORATION
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP 19172644 2019.09.24
- Main IPC: C30B29/40
- IPC: C30B29/40 ; C30B33/08 ; C30B25/02
Abstract:
A group-III nitride substrate includes: a first region having a first impurity concentration in a polished surface; and a second region having a second impurity concentration lower than the first impurity concentration in the polished surface, wherein a first dislocation density of the first region is lower than a second dislocation density of the second region.
Public/Granted literature
- US20210087707A1 GROUP-III NITRIDE SUBSTRATE Public/Granted day:2021-03-25
Information query
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