Method and system for inspecting growth quality of graphene
Abstract:
Provided is a method of inspecting a growth quality of a graphene layer of a graphene-grown copper foil obtained by growing the graphene layer on a copper foil layer by chemical vapor deposition (CVD), the method including reacting oxygen or water molecules with the copper foil layer via a defect portion of the graphene layer, partitioning an entire region of the graphene-grown copper foil into partial regions, sequentially obtaining images of the partial regions, detecting, with respect to each of the images of the partial regions, an oxidized region where the copper foil layer is oxidized, and setting the oxidized region as a graphene defect region, and obtaining a ratio of an area of the graphene defect region to an entire area of each of the images of the partial regions.
Public/Granted literature
Information query
Patent Agency Ranking
0/0