Invention Grant
- Patent Title: Process proximity correction method and the computing device for the same
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Application No.: US17245947Application Date: 2021-04-30
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Publication No.: US11714347B2Publication Date: 2023-08-01
- Inventor: Soo Yong Lee , Min-Cheol Kang , U Seong Kim , Seung Hune Yang , Jee Yong Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR 20200094254 2020.07.29
- Main IPC: G03F1/36
- IPC: G03F1/36 ; G03F1/76 ; G06T3/40 ; G06T7/00 ; G06F30/3323 ; G06F30/392

Abstract:
A process proximity correction method is performed by a process proximity correction computing device which performs a process proximity correction (PPC) through at least one of a plurality of processors. The process proximity correction method includes: converting a target layout including a plurality of patterns into an image, zooming-in or zooming-out the image at a plurality of magnifications to generate a plurality of input channels, receiving the plurality of input channels and performing machine learning to predict an after-cleaning image (ACI), comparing the predicted after-cleaning image with a target value to generate an after-cleaning image error, and adjusting the target layout on the basis of the after-cleaning image error.
Public/Granted literature
- US20220035237A1 PROCESS PROXIMITY CORRECTION METHOD AND THE COMPUTING DEVICE FOR THE SAME Public/Granted day:2022-02-03
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