- Patent Title: Machine learning-based root cause analysis of process cycle images
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Application No.: US17161595Application Date: 2021-01-28
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Publication No.: US11715200B2Publication Date: 2023-08-01
- Inventor: Naghmeh Rezaei , Pedro Miguel Filipe Cruz
- Applicant: Illumina, Inc.
- Applicant Address: US CA San Diego
- Assignee: Illumina, Inc.
- Current Assignee: Illumina, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Flaster Greenberg P.C.
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06T5/20 ; G06N20/20 ; G06N5/04 ; G16B25/00 ; G06F18/2433 ; G06F18/214 ; G06F18/21 ; G06F18/243 ; G06N5/01 ; G06V10/56 ; G06V10/764 ; G06V10/77 ; G06V10/774 ; G06V10/98 ; G06V20/69 ; G01N21/64

Abstract:
The technology disclosed relates to classification of process cycle images to predict success or failure of process cycles. The technology disclosed includes capturing and processing images of sections arranged on an image generating chip in genotyping process. Image description features of production cycle images are created and given as input to classifiers. A trained classifier separates successful production images from unsuccessful or failed production images. The failed production images are further classified by a trained root cause classifier into various categories of failure.
Public/Granted literature
- US20210241048A1 Machine Learning-Based Root Cause Analysis of Process Cycle Images Public/Granted day:2021-08-05
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