- Patent Title: Substrate misalignment detection method, substrate position abnormality determination method, substrate transfer control method, and substrate misalignment detection device
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Application No.: US17141830Application Date: 2021-01-05
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Publication No.: US11715657B2Publication Date: 2023-08-01
- Inventor: Shinjiro Watanabe , Koji Aramaki
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer; Tanya E. Harkins
- Priority: JP 20000894 2020.01.07
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67 ; G06T7/00 ; H01L21/677 ; H01L21/66

Abstract:
A substrate misalignment detection method includes: acquiring first image information or first position information of a substrate held to a stage by suction at a first height position; delivering the substrate from the stage to a holder in a state in which the suction of the substrate is released and causing the holder to hold the substrate at the first height position; acquiring second image information or second position information of the substrate held at the first height position; and detecting misalignment of the substrate by comparing the first image information with the second image information or by comparing the first position information with the second position information.
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