Invention Grant
- Patent Title: Film forming system, magnetization characteristic measuring device, and film forming method
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Application No.: US17021846Application Date: 2020-09-15
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Publication No.: US11715671B2Publication Date: 2023-08-01
- Inventor: Hiroaki Chihaya , Einstein Noel Abarra , Shota Ishibashi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Fenwick & West LLP
- Priority: JP 19169296 2019.09.18
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01R33/032 ; G01N27/72 ; C23C14/56 ; H10N50/01

Abstract:
A film forming system for forming a magnetic film is provided. The film forming system includes a processing module configured to form the magnetic film on a substrate, a magnetization characteristic measuring device configured to measure magnetization characteristics of the magnetic film formed on the substrate in the processing module, and a transfer unit configured to transfer the substrate between the processing module and the magnetization characteristic measuring device. The magnetization characteristic measuring device includes a magnetic field applying mechanism having a permanent magnet magnetic circuit configured to apply a magnetic field to the substrate and adjust the magnetic field to be applied to the substrate, and a detector configured to detect magnetization characteristics of the substrate.
Public/Granted literature
- US20210082777A1 FILM FORMING SYSTEM, MAGNETIZATION CHARACTERISTIC MEASURING DEVICE, AND FILM FORMING METHOD Public/Granted day:2021-03-18
Information query
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