Invention Grant
- Patent Title: Silicon carbide semiconductor device
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Application No.: US17311000Application Date: 2020-03-03
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Publication No.: US11715767B2Publication Date: 2023-08-01
- Inventor: Hisato Michikoshi
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: IPUSA, PLLC
- Priority: JP 19045171 2019.03.12
- International Application: PCT/JP2020/008952 2020.03.03
- International Announcement: WO2020/184304A 2020.09.17
- Date entered country: 2021-09-03
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L23/00

Abstract:
A silicon carbide semiconductor device includes a metal plate having a first main surface and a second main surface, the second main surface being opposite to the first main surface, an insulating film provided on a portion of the first main surface of the metal plate, a first conductive layer provided on the insulating film, and a silicon carbide semiconductor chip. The silicon carbide semiconductor chip includes a first electrode and a second electrode on a first surface and a third electrode on a second surface, the second surface being opposite to the first surface. The first surface of the silicon carbide semiconductor chip faces the first main surface of the metal plate, the first electrode is bonded to the first conductive layer with a first bonding material, and the second electrode is bonded to the first main surface of the metal plate with a second bonding material.
Public/Granted literature
- US20220165851A1 SILICON CARBIDE SEMICONDUCTOR DEVICE Public/Granted day:2022-05-26
Information query
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