Invention Grant
- Patent Title: Silicon carbide components and methods for producing silicon carbide components
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Application No.: US17350586Application Date: 2021-06-17
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Publication No.: US11715768B2Publication Date: 2023-08-01
- Inventor: Roland Rupp , Ronny Kern
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE 2017119568.8 2017.08.25
- Main IPC: H01L31/0312
- IPC: H01L31/0312 ; H01L29/16 ; H01L21/78 ; H01L29/66 ; H01L21/02 ; H01L21/04 ; H01L21/268 ; H01L21/304 ; H01L29/06 ; H01L21/265 ; H01L29/739 ; H01L29/78 ; H01L29/872

Abstract:
A method for producing a silicon carbide component includes forming a silicon carbide layer on an initial wafer, forming a doping region of the silicon carbide component to be produced in the silicon carbide layer, and forming an electrically conductive contact structure of the silicon carbide component to be produced on a surface of the silicon carbide layer. The electrically conductive contact structure electrically contacts the doping region. Furthermore, the method includes splitting the silicon carbide layer or the initial wafer after forming the electrically conductive contact structure, such that a silicon carbide substrate at least of the silicon carbide component to be produced is split off.
Public/Granted literature
- US20210313431A1 Silicon Carbide Components and Methods for Producing Silicon Carbide Components Public/Granted day:2021-10-07
Information query
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