Invention Grant
- Patent Title: Nonvolatile memory device
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Application No.: US17143216Application Date: 2021-01-07
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Publication No.: US11716849B2Publication Date: 2023-08-01
- Inventor: Gi Yong Chung , Ho Jin Kim , Young-Jin Kwon , Dong Seog Eun
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR 20200048826 2020.04.22
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H10B43/27 ; G11C8/14 ; H10B41/10 ; H10B41/27 ; H10B41/40 ; H10B43/10 ; H10B43/40

Abstract:
A nonvolatile memory device includes a substrate including a cell array region, a first gate electrode including an opening on the cell array region of the substrate, a plurality of second gate electrodes stacked above the first gate electrode and including convex portions having an outward curve extending toward the substrate, and a word line cutting region cutting the opening and the convex portions.
Public/Granted literature
- US20210335811A1 NONVOLATILE MEMORY DEVICE Public/Granted day:2021-10-28
Information query
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