Invention Grant
- Patent Title: Non-volatile memory with dual gated control
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Application No.: US17116024Application Date: 2020-12-09
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Publication No.: US11716862B2Publication Date: 2023-08-01
- Inventor: Katherine H Chiang , Chung-Te Lin
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H10B99/00 ; H01L29/786

Abstract:
A memory device includes a plurality of memory cells. A first memory cell of the plurality of memory cells includes a first write transistor includes a first write gate, a first write source, and a first write drain. A first read transistor includes first read gate, a first read source, a first read drain, and a first body region separating the first read source from the first read drain. The first read source is coupled to the first write source. A first capacitor has a first upper capacitor plate coupled to the first write drain and a first lower capacitor plate coupled to the first body region of the first read transistor.
Public/Granted literature
- US20210375867A1 NON-VOLATILE MEMORY WITH DUAL GATED CONTROL Public/Granted day:2021-12-02
Information query
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