- Patent Title: Magnetic tunnel junction (MTJ) element and its fabrication process
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Application No.: US17070426Application Date: 2020-10-14
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Publication No.: US11716909B2Publication Date: 2023-08-01
- Inventor: Ya-Ling Lee , Tsann Lin , Han-Jong Chia
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT Law
- Agent Anthony King
- Main IPC: H10N50/10
- IPC: H10N50/10 ; G01R33/09 ; G11C11/16 ; H10B61/00 ; H10N50/01 ; H10N50/80 ; H10N50/85

Abstract:
A magnetic tunnel junction (MTJ) element is provided. The MTJ element includes a reference layer, a tunnel barrier layer disposed over the reference layer, a free layer disposed over the tunnel barrier layer, and a diffusion barrier layer disposed over the free layer. The MU element in accordance with the present disclosure exhibits a low resistance desired for a low-power write operation, and a high TIM coefficient desired for a low bit-error-rate (BER) read operation.
Public/Granted literature
- US20220115586A1 MAGNETIC TUNNEL JUNCTION (MTJ) ELEMENT AND ITS FABRICATION PROCESS Public/Granted day:2022-04-14
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