Method of manufacturing fine pattern and method of manufacturing display device using the same
Abstract:
A method of manufacturing a fine pattern using the following steps of:

(1) coating a resist composition containing a novolak resin having an alkali dissolution rate of 100 to 3,000 Å on a substrate to form a resist composition layer;
(2) subjecting said resist composition layer to exposure;
(3) developing said resist composition layer to form a resist pattern;
(4) subjecting said resist pattern to flood exposure;
(5) coating a fine pattern forming composition on the surface of said resist pattern to form a fine pattern forming composition layer;
(6) heating said resist pattern and said fine pattern forming composition layer to cure the regions of said fine pattern forming composition layer in the vicinity of said resist pattern and to form an insolubilized layer; and
(7) removing uncured regions of said fine pattern forming composition layer.
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