Invention Grant
- Patent Title: Method of manufacturing fine pattern and method of manufacturing display device using the same
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Application No.: US16757430Application Date: 2018-10-17
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Publication No.: US11718082B2Publication Date: 2023-08-08
- Inventor: Hirokazu Ikeda , Toshiaki Nonaka , Yoshisuke Toyama , Takahide Suzuki
- Applicant: Merck Patent GmbH
- Applicant Address: DE Darmstadt
- Assignee: Merck Patent GmbH
- Current Assignee: Merck Patent GmbH
- Current Assignee Address: DE Darmstadt
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JP 17203836 2017.10.20
- International Application: PCT/EP2018/078351 2018.10.17
- International Announcement: WO2019/076956A 2019.04.25
- Date entered country: 2020-04-20
- Main IPC: B32B38/00
- IPC: B32B38/00 ; B32B5/14 ; G03F7/18 ; G03F7/24 ; G03F7/40

Abstract:
A method of manufacturing a fine pattern using the following steps of:
(1) coating a resist composition containing a novolak resin having an alkali dissolution rate of 100 to 3,000 Å on a substrate to form a resist composition layer;
(2) subjecting said resist composition layer to exposure;
(3) developing said resist composition layer to form a resist pattern;
(4) subjecting said resist pattern to flood exposure;
(5) coating a fine pattern forming composition on the surface of said resist pattern to form a fine pattern forming composition layer;
(6) heating said resist pattern and said fine pattern forming composition layer to cure the regions of said fine pattern forming composition layer in the vicinity of said resist pattern and to form an insolubilized layer; and
(7) removing uncured regions of said fine pattern forming composition layer.
(1) coating a resist composition containing a novolak resin having an alkali dissolution rate of 100 to 3,000 Å on a substrate to form a resist composition layer;
(2) subjecting said resist composition layer to exposure;
(3) developing said resist composition layer to form a resist pattern;
(4) subjecting said resist pattern to flood exposure;
(5) coating a fine pattern forming composition on the surface of said resist pattern to form a fine pattern forming composition layer;
(6) heating said resist pattern and said fine pattern forming composition layer to cure the regions of said fine pattern forming composition layer in the vicinity of said resist pattern and to form an insolubilized layer; and
(7) removing uncured regions of said fine pattern forming composition layer.
Public/Granted literature
- US20210187930A1 METHOD OF MANUFACTURING FINE PATTERN AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAM Public/Granted day:2021-06-24
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