Invention Grant
- Patent Title: Techniques for controlling precursors in chemical deposition processes
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Application No.: US17012980Application Date: 2020-09-04
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Publication No.: US11718914B2Publication Date: 2023-08-08
- Inventor: Elaina Babayan , Sarah White , Vijay Venugopal , Jonathan Bakke
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Agency: KDW Firm PLLC
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C23C16/448 ; H01L21/67 ; C23C16/455 ; G05D16/04 ; G01F1/00 ; G05D11/13 ; G05D16/00 ; H01L21/00 ; H01L21/66 ; G05D11/00
Abstract:
An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.
Information query
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