Invention Grant
- Patent Title: Chemically amplified resist composition and patterning process
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Application No.: US16930539Application Date: 2020-07-16
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Publication No.: US11720018B2Publication Date: 2023-08-08
- Inventor: Jun Hatakeyama
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JP 19148853 2019.08.14
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08L33/06 ; G03F7/039 ; G03F7/20 ; C08L25/08 ; G03F7/038
Abstract:
A chemically amplified resist composition comprising a quencher containing an ammonium salt of an iodized or brominated phenol and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU.
Public/Granted literature
- US20210048747A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2021-02-18
Information query
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