Invention Grant
- Patent Title: Material management method and system
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Application No.: US17476420Application Date: 2021-09-15
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Publication No.: US11720033B2Publication Date: 2023-08-08
- Inventor: Rong-Syuan Fan , Ching-Jung Chang , Chi-Feng Tung , Hsiang-Yin Shen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00
Abstract:
A method includes: storing a carrier containing material in a storage; recording environmental data of the storage to a database while the material is in the storage; generating a forecast for the material in the carrier based on the environmental data; receiving a request for the material from a semiconductor fabrication tool; and providing the carrier to the semiconductor fabrication tool based on the forecast.
Public/Granted literature
- US20220283520A1 MATERIAL MANAGEMENT METHOD AND SYSTEM Public/Granted day:2022-09-08
Information query
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