- Patent Title: Parameter adjustment method of bonding apparatus and bonding system
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Application No.: US17269366Application Date: 2019-08-20
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Publication No.: US11721596B2Publication Date: 2023-08-08
- Inventor: Norifumi Kohama
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP 18160051 2018.08.29
- International Application: PCT/JP2019/032383 2019.08.20
- International Announcement: WO2020/045158A 2020.03.05
- Date entered country: 2021-02-18
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/66

Abstract:
A parameter adjustment method includes an acquisition process and a parameter changing process. The acquisition process acquires, from an inspection apparatus configured to inspect a combined substrate in which the first substrate and the second substrate are bonded by the bonding apparatus, an inspection result indicating a direction and a degree of distortion occurring in the combined substrate. The parameter changing process changes at least one of multiple parameters including at least one of the gap, an attraction pressure of the first substrate by the first holder, an attraction pressure of the second substrate by the second holder or a pressing force on the first substrate by the striker, based on trend information indicating a tendency of a change in the direction and the degree of the distortion when each of the multiple parameters is changed and the inspection result acquired in the acquiring of the inspection result.
Public/Granted literature
- US20210327773A1 PARAMETER ADJUSTMENT METHOD OF BONDING APPARATUS AND BONDING SYSTEM Public/Granted day:2021-10-21
Information query
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