Invention Grant
- Patent Title: Optically detectable reference feature for processing a semiconductor wafer
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Application No.: US17126743Application Date: 2020-12-18
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Publication No.: US11721638B2Publication Date: 2023-08-08
- Inventor: Oliver Blank
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE 2018103738.4 2018.02.20
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L21/66 ; H01L21/78

Abstract:
A semiconductor wafer has a semiconductor body, an insulation layer on the semiconductor body, a scribeline region designated to be subjected to a wafer separation processing stage, and an optically detectable reference feature laterally spaced inward from the scribeline region and configured to serve as a reference position during the wafer separation processing stage. A corresponding method of processing the semiconductor wafer, a power semiconductor die and a semiconductor wafer separation apparatus are also described.
Public/Granted literature
- US20210104470A1 Optically Detectable Reference Feature for Processing a Semiconductor Wafer Public/Granted day:2021-04-08
Information query
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