Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US17715541Application Date: 2022-04-07
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Publication No.: US11723204B2Publication Date: 2023-08-08
- Inventor: Hiroshi Kanno
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 19157156 2019.08.29
- Main IPC: H10B43/27
- IPC: H10B43/27 ; H01L29/10

Abstract:
The semiconductor storage device of an embodiment includes a first conductive layer, a stack disposed above the first conductive layer and including a plurality of second conductive layers in a first direction, and a columnar body that extends in the first direction through the stack, and includes a semiconductor layer and a charge storage film provided between the plurality of conductive layers and the semiconductor layer. A first conductive layer out of the plurality of conductive layers is connected to the semiconductor layer, and the semiconductor layer includes a first region in which a concentration of an n-type impurity is higher than a concentration of a p-type impurity, a second region in which a concentration of a p-type impurity is higher than a concentration of an n-type impurity, and a third region contacted to the first conductive layer and disposed closer to the first region than the second region in the first direction.
Public/Granted literature
- US20220231047A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2022-07-21
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