- Patent Title: Substrate processing apparatus and method of processing substrate
-
Application No.: US17336657Application Date: 2021-06-02
-
Publication No.: US11723259B2Publication Date: 2023-08-08
- Inventor: Koukichi Hiroshiro , Jun Nonaka , Kazuya Koyama , Mitsunori Nakamori
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Armstrong Teasdale LLP
- Priority: JP 20100983 2020.06.10
- Main IPC: H10K71/15
- IPC: H10K71/15 ; H10K77/10 ; H10K85/10

Abstract:
A method of processing a substrate includes loading the substrate to which a processing liquid is adhered, inside a processing container, removing the processing liquid adhering to the substrate by supplying a first organic solvent to the loaded substrate, causing the substrate to be water-repellent by supplying a water repellent to the substrate from which the processing liquid has been removed, supplying a second organic solvent to the water-repellent substrate, and drying the substrate by volatilizing the second organic solvent adhering to the substrate.
Public/Granted literature
- US20210391539A1 SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE Public/Granted day:2021-12-16
Information query