Invention Grant
- Patent Title: Stand-up pouch for retort
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Application No.: US15566873Application Date: 2016-04-20
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Publication No.: US11745483B2Publication Date: 2023-09-05
- Inventor: Shintaro Usui
- Applicant: THE NIPPON SYNTHETIC CHEMICAL INDUSTRY CO., LTD.
- Applicant Address: JP Osaka
- Assignee: MITSUBISHI CHEMICAL CORPORATION
- Current Assignee: MITSUBISHI CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: GREENBLUM & BERNSTEIN, P.L.C.
- Priority: JP 15086244 2015.04.20 JP 15086245 2015.04.20
- International Application: PCT/JP2016/062566 2016.04.20
- International Announcement: WO2016/171192A 2016.10.27
- Date entered country: 2017-10-16
- Main IPC: B65D30/00
- IPC: B65D30/00 ; B32B27/34 ; B32B27/00 ; B32B27/28 ; B65D81/34 ; B65D65/40 ; B32B27/32 ; B65D81/24 ; B32B7/12 ; B32B27/08 ; B32B27/30 ; B32B27/36 ; B32B37/12 ; B65D75/00

Abstract:
An object of the present invention is to provide a stand-up pouch for retort which has a high rate of gas barrier property recovery after retort processing and can stably retain high gas barrier properties. The stand-up pouch for retort of the invention comprises a laminate which comprises a base film and, disposed over one surface of the base film, a polyamide resin layer, a saponified ethylene-vinyl ester copolymer layer, and a heat-sealing resin layer, wherein the polyamide resin layer adjoins the saponified ethylene-vinyl ester copolymer layer.
Public/Granted literature
- US20180099493A1 STAND-UP POUCH FOR RETORT Public/Granted day:2018-04-12
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