Invention Grant
- Patent Title: Single step electrolytic method of filling through holes in printed circuit boards and other substrates
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Application No.: US16674052Application Date: 2019-11-05
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Publication No.: US11746433B2Publication Date: 2023-09-05
- Inventor: Donald Desalvo , Ron Blake , Carmichael Gugliotti , William J. Decesare , Richard Bellemare
- Applicant: MacDermid Enthone Inc.
- Applicant Address: US CT Waterbury
- Assignee: MACDERMID ENTHONE INC.
- Current Assignee: MACDERMID ENTHONE INC.
- Current Assignee Address: US CT Waterbury
- Agency: Carmody Torrance Sandak & Hennessey LLP
- Main IPC: C25D3/38
- IPC: C25D3/38 ; H05K3/42 ; H05K1/18 ; H05K1/02 ; C25D5/18 ; H05K7/20 ; C25D7/00 ; C25D5/02

Abstract:
A method of copper electroplating in the manufacture of printed circuit boards. The method is used for filling through-holes and micro-vias with copper. The method includes the steps of: (1) preparing an electronic substrate to receive copper electroplating thereon; (2) forming at least one of one or more through-holes and/or one or more micro-vias in the electronic substrate; and (3) electroplating copper in the at one or more through-holes and/or one or more micro-vias by contacting the electronic substrate with an acid copper electroplating solution. The acid copper plating solution comprises a source of copper ions; sulfuric acid; a source of chloride ions; a brightener; a wetter; and a leveler. The acid copper electroplating solution plates the one or more through-holes and/or the one or more micro-vias until metallization is complete.
Public/Granted literature
- US20210130970A1 Single Step Electrolytic Method of Filling Through Holes in Printed Circuit Boards and Other Substrates Public/Granted day:2021-05-06
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