Invention Grant
- Patent Title: Determining performance metrics for a device under test using nearfield measurement results
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Application No.: US17831200Application Date: 2022-06-02
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Publication No.: US11747383B2Publication Date: 2023-09-05
- Inventor: José Moreira
- Applicant: Advantest Corporation
- Applicant Address: JP Tokyo
- Assignee: Advantest Corporation
- Current Assignee: Advantest Corporation
- Current Assignee Address: JP Tokyo
- Main IPC: G01R27/32
- IPC: G01R27/32 ; G01R29/10 ; H04B5/00

Abstract:
Embodiments of the present invention provide systems and methods for performing tests on a device under test (DUT) based on training data derived from a set of training DUTs using nearfield measurement data. Nearfield measurement data can be mapped to performance metrics that approximate performance metrics derived from the far-field measurement data. Nearfield measurements can then be performed on a DUT to generate second nearfield measurement data, and performance metrics of the DUT are generated using the second nearfield measurement data and the mapped performance metrics derived from the training DUTs.
Public/Granted literature
- US20220291271A1 DETERMINING PERFORMANCE METRICS FOR A DEVICE UNDER TEST USING NEARFIELD MEASUREMENT RESULTS Public/Granted day:2022-09-15
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