Invention Grant
- Patent Title: Resist composition and method of forming resist pattern
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Application No.: US16909100Application Date: 2020-06-23
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Publication No.: US11747726B2Publication Date: 2023-09-05
- Inventor: Yuki Fukumura , Tatsuya Fujii , Yoichi Hori
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki
- Agency: KNOBBE, MARTENS, OLSON & BEAR LLP
- Priority: JP 19117511 2019.06.25
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; C08F222/18 ; G03F7/32

Abstract:
A resist composition including a base component and a fluorine additive component (F), the component (F) including a copolymer having a structural unit (f1) represented by general formula (f1-1) or (f1-2), and a structural unit (f2) represented by general formula (f2-1) (in formula (f1-1) and (f2-1), R represents a hydrogen atom or the like; at least one of Raf11 and Raf12, and at least one of Raf13 and Raf14 represents a hydrocarbon group substituted with a fluorine atom, and the total number of carbon atoms is 3 or more, provided that a hydrocarbon group forming a bridge structure is excluded; and the structural unit (f2) has a specific acid dissociable group containing an aliphatic cyclic group having no bridge structure
Information query
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