- Patent Title: Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same
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Application No.: US17572509Application Date: 2022-01-10
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Publication No.: US11749522B2Publication Date: 2023-09-05
- Inventor: Sung Gi Kim , Jeong Joo Park , Joong Jin Park , Se Jin Jang , Byeong-Il Yang , Sang-Do Lee , Sam Dong Lee , Sang Ick Lee , Myong Woon Kim
- Applicant: DNF CO., LTD.
- Applicant Address: KR Daejeon
- Assignee: DNF CO., LTD.
- Current Assignee: DNF CO., LTD.
- Current Assignee Address: KR Daejeon
- Agency: McCoy Russell LLP
- Priority: KR 20170040078 2017.03.29 KR 20170055632 2017.04.28 KR 20180035010 2018.03.27
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/32 ; C01B33/18 ; C01B21/068 ; C07F7/10 ; C23C16/455 ; C23C16/50 ; C23C16/40 ; C23C16/34 ; C23C16/30 ; C23C16/36 ; C09D1/00
Abstract:
Provided are a composition for depositing a silicon-containing thin film containing a bis(aminosilyl)alkylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing the bis(aminosilyl)alkylamine compound capable of being usefully used as a precursor of the silicon-containing thin film, and a method for manufacturing a silicon-containing thin film using the same.
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