Invention Grant
- Patent Title: Semiconductor manufacturing apparatus
-
Application No.: US17233937Application Date: 2021-04-19
-
Publication No.: US11749667B2Publication Date: 2023-09-05
- Inventor: Toshihiko Ohda , Tetsuya Kurosawa , Masatoshi Fukuda
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 2018053369 2018.03.20
- The original application number of the division: US16125996 2018.09.10
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L21/66 ; H01L25/00 ; H01L23/00

Abstract:
A semiconductor manufacturing method of mounting a semiconductor chip or a stacked body of semiconductor chips on a support substrate placed on a stage, determines whether a predetermined condition is satisfied during a mounting processing of the semiconductor chip or the stacked body, evacuates, together with the support substrate, the semiconductor chip or the stacked body that has mounted on the support substrate before the determination when it is determined that the predetermined condition is satisfied, determines whether to resume the mounting processing of the semiconductor chip or the stacked body after the evacuation; and returns the evacuated semiconductor chip or the evacuated stacked body to a position before the evacuation and continuing the mounting processing when it is determined that the mounting processing is resumed.
Public/Granted literature
- US20210242191A1 SEMICONDUCTOR MANUFACTURING APPARATUS Public/Granted day:2021-08-05
Information query
IPC分类: