Invention Grant
- Patent Title: Manufacturing method of array substrate, array substrate and display device
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Application No.: US17194484Application Date: 2021-03-08
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Publication No.: US11749693B2Publication Date: 2023-09-05
- Inventor: Yuming Xia , En-tsung Cho , Lidan Ye
- Applicant: BEIHAI HKC OPTOELECTRONICS TECHNOLOGY CO., LTD. , HKC CORPORATION LIMITED
- Applicant Address: CN Beihai
- Assignee: BEIHAI HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.,HKC CORPORATION LIMITED
- Current Assignee: BEIHAI HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.,HKC CORPORATION LIMITED
- Current Assignee Address: CN Beihai; CN Shenzhen
- Agency: Westbridge IP LLC
- Priority: CN 2010740589.4 2020.07.28
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L27/12

Abstract:
Disclosed are a manufacturing method of an array substrate, an array substrate and a display device. The manufacturing method of the array substrate includes: providing a substrate; depositing and patterning a gate layer on the substrate; depositing a protective layer on the substrate covered with the gate layer by atomic layer deposition; and depositing and patterning an amorphous silicon layer and an ohmic contact layer on the protective layer. The uniform protective layer of the present disclosure reduces the influence on the field effect mobility of the thin film transistor, makes the display of the product more stable, and improves the display effect.
Public/Granted literature
- US20220037377A1 MANUFACTURING METHOD OF ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE Public/Granted day:2022-02-03
Information query
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