Invention Grant
- Patent Title: Split-gate trench MOSFET
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Application No.: US17819971Application Date: 2022-08-16
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Publication No.: US11749750B2Publication Date: 2023-09-05
- Inventor: Chiao-Shun Chuang , Tsung-Wei Pai , Yun-Pu Ku
- Applicant: Diodes Incorporated
- Applicant Address: US TX Plano
- Assignee: Diodes Incorporated
- Current Assignee: Diodes Incorporated
- Current Assignee Address: US TX Plano
- Agent Steven A. Shaw
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/423 ; H01L29/40

Abstract:
A split-gate trench device chip has an active region in which a plurality of active trenches are disposed. The active region is enclosed by termination trenches disposed in a termination region, which extends to the edges of the chip. A gate metal lead is disposed on the device surface. The gate metal lead makes contact to gate electrodes in the active trenches through contact holes disposed in the active region. A source or a drain metal lead is also disposed on the surface. The source or the drain metal lead makes contact to the field plate electrodes through contact holes disposed outside the active region. Each active trench in the active region has a first end merge into a first termination trench and a second end separated from an adjacent second termination trench.
Public/Granted literature
- US20230163211A1 Split-Gate Trench MOSFET Public/Granted day:2023-05-25
Information query
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