Invention Grant
- Patent Title: Avalanche photodetector (variants) and method for manufacturing the same (variants)
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Application No.: US17432916Application Date: 2020-03-04
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Publication No.: US11749774B2Publication Date: 2023-09-05
- Inventor: Nikolai Afanasevich Kolobov , Konstantin Yurevich Sitarskiy , Vitalii Emmanuilovich Shubin , Dmitrii Alekseevich Shushakov , Sergei Vitalevich Bogdanov
- Applicant: DEPHAN LLC
- Applicant Address: RU Moscow
- Assignee: DEPHAN LLC
- Current Assignee: DEPHAN LLC
- Current Assignee Address: RU Moscow
- Agency: Bardmesser Law Group
- Priority: RU 19106820 2019.03.12
- International Application: PCT/RU2020/050037 2020.03.04
- International Announcement: WO2020/185124A 2020.09.17
- Date entered country: 2021-08-21
- Main IPC: H01L31/107
- IPC: H01L31/107 ; H01L31/0224 ; H01L31/028 ; H01L31/18

Abstract:
An APD includes a photoconverter and at least one avalanche amplifier of the photocurrent, the amplifier having two layers—a contact layer and a multiplication layer, wherein the multiplication layer is formed on top of the entire conductive wafer, while the contact layer of at least one avalanche amplifier is formed on top of a certain area of the multiplication layer. Meanwhile, outside the contact layer, the multiplication layer functions as a photoconverter. This makes it possible for photocarriers to get into the avalanche amplifier effectively and unimpeded. In order to mitigate the influence of parasite near-surface charge carriers on the avalanche amplifier, its multiplication region is deepened in relation to the upper surface of the photoconverter region. The proposed APD embodiment with less dark current seeping from peripheral areas of the instrument provides higher threshold sensitivity that allows it be on par with state of the art.
Public/Granted literature
- US20220199847A1 AVALANCHE PHOTODETECTOR (VARIANTS) AND METHOD FOR MANUFACTURING THE SAME (VARIANTS) Public/Granted day:2022-06-23
Information query
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